EXT75DX
The EXT75DX combine the proven technology of a ceramic mechanical lower bearing, a dry permanent magnetic upper bearing and Holweck drag stage with the added convenience of an on-board controller and a 24V motor.
EXT75DX
The EXT75DX combine the proven technology of a ceramic mechanical lower bearing, a dry permanent magnetic upper bearing and Holweck drag stage with the added convenience of an on-board controller and a 24V motor.
EXT255DX
The EXT255DX combine the proven technology of a ceramic mechanical lower bearing, a dry permanent magnetic upper bearing and Holweck drag stage with the added convenience of an on-board controller and a 24V motor.
EXT556H
The EXT556H incorporates hybrid bearing and enhanced molecular drag pumping technologies with turbomolecular pump stages on a single rotor. The result is a highly reliable pump well suited to applications requiring excellent light gas performance and ultimate pressures <10-10 mbar.
STP603
STP603 is used in the most advanced semiconductor applications. This pump has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
STP1003
STP1003 is used in the most advanced semiconductor applications. This pump has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
STPA803C
STPA803C is designed for use in semiconductor applications. The STPA803C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
STPA1303C
STPA1303C is adesigned for use in semiconductor applications. The STPA1303C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
STPA1603C
STPA1603C provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.
STPA2203C
STPA2203C is designed for use in semiconductor applications. A new half rack controller gives additional space savings and incorporates d.c. drive technology for battery-free operation.
STPH301C
STPH301Chas been designed for use in the harshest of semiconductor applications. The pumps field proven reliability and class-leading performance give maximum process flexibility.
STP-L301
STP-L301 is for use in electron microscopes and semiconductor applications. Edwards rotor technology gives class-leading performance for maximum process flexibility.
STP-XA2703C
STP-XA2703C based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.
STP-XA3203C
STP-XA3203C is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.
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